Invited Speakers

Stefan Decoster holds an M.Sc. degree in physics from KU Leuven, where he also received a PhD degree in physics in 2009 on ion implantation-related lattice damage in semiconductors. After working one year as a post-doctoral researcher at the Australian National University in Canberra, he joined imec in 2012 as an R&D dry etch engineer. He is specialized in back-end-of-line (BEOL) dry etch processing and advanced patterning.

Laurent Grenouillet received the Engineer degree in physics in 1998 from the National Institute of Applied Sciences (INSA) in Lyon, France, and the PhD degree in electronic devices in 2001 for his work on the optical spectroscopy of diluted nitrides grown on GaAs substrates. After a post-doctoral position in the field of Molecular Beam Epitaxy, he joined CEA-Leti in 2002 and worked on GaAs-based VCSELs emitting in the 1.1-1.3μm range and single photon sources with quantum dots. In 2006, he joined the Silicon Photonics group where he developed CMOS compatible hybrid III-V on silicon lasers. In 2009, he joined IBM Alliance in Albany as a Leti assignee to contribute to the development of FDSOI technology. Within Albany state-of-the-art facilities, he extensively worked on device integration to improve performance of FDSOI devices (28nm and 14nm node). Back in France at CEA-LETI in 2013, he focused on the performance boosters for the 10nm node FDSOI technology, and took part to the FDSOI technology transfer to Global Foundries (22FDX) in 2015. During that period he joined the Advanced Memory Device Laboratory at CEA-Leti. His current research interests include resistive switching memory devices and selectors, and ferroelectric HfO2-based memories. Laurent Grenouillet authored or co-authored over 80 papers (conferences and journals) and has filed over 40 patents. He serves as committee member of Solid-State Devices and Materials (SSDM) conference.

Let’s start with completing my Bachelor degree in Physics from the LMU Munich in 2010, before attending the University of Maryland, College Park, at the Institute for Research in Electronics and Applied Physics from 2010 to 2016. My main focus during that time in Prof Oehrlein’s lab was the development of fluorocarbon based atomic layer etching of SiO2, SiN, and Si. I received my PhD in the spring of 2016. In June of 2016 I started working at IBM Research in Albany, NY. In the over six years working as a process engineer at IBM Research, I mainly focused on BEOL RIE for various application, e.g. in logic scaling and MRAM. In the recent years I have expanded my role from an etch process engineer outside of the RIE sector directly into design, lithography, integration, and project planning.

Thomas Gilmore is the Chief Product Officer at Impedans Ltd., a company focused on plasma measurement instruments. He studied undergraduate physics in Dublin City University and earned a PhD in physics from Queen's University Belfast. Tom has been working with RF-driven plasmas for industrial applications for over 13 years, the last 6 of which with Impedans.